Novel CD-SEM Overlay Method: Improves Dual Trench Patterning CDU - Semiconductor International - 2008/02/01 - Reed Business Information

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Title:	Novel CD-SEM Overlay Method: Improves Dual Trench Patterning CDU
Price:	$15.00
Publication Date:	Feb 01, 2008
Source:	Semiconductor International
Author:	Ilan Englard, Rich Piech, Liraz Gershtein, Ram Peltinov, Ofer Adan
Brief Excerpt:	Novel CD-SEM Overlay Method: Improves Dual Trench Patterning CDUIlan Englard, Rich Piech, Liraz Gershtein, Ram Peltinov, Ofer Adan, Applied Materials Inc., Santa Clara, Calif. www.appliedmaterials.comUsing a trench-within-a-trench overlay...
Word Count:	1463
Format:	HTML

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