The Group's principal activity is to design, develop and manufacture high-performance process control metrology and defect inspection systems used in semiconductor device manufacturers. It provides full-fab solutions through a family of stand-alone systems and integrated modules for both transparent and opaque thin film measurements and macro-defect detection. The Group's thin film measurement proprietary systems measure the thickness and other properties of thin films applied during various steps in the manufacture of integrated circuits, enabling semiconductor device manufacturers to improve yields and reduce overall production costs. Also includes macro-defect inspection proprietary systems detect and classify defects in semiconductor wafers. The Group's system support in variety of applications in diffusion, etch, lithography, CVD, PVD, CMP and macro-defect detection.
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